A Model of a Horizontal Atmospheric Pressure Chemical Vapor Deposition Reactor
Veröffentlicht in 2008
A model of a horizontal atmospheric pressure chemical vapor deposition reactor was implemented to aid in the design of a laboratory based one.
The model coupled momentum transport, energy transport, and mass transport phenomena to account for reacting fluid flow of a compressible gas in a heated chamber. The system modeled was silicon deposition from trichlorosilane in hydrogen carrier gas.
Herunterladen
- Adams.pdf - 0.77MB