Modeling the Etching of Nanostructures in COMSOL Multiphysics®
Länge: 57:49
Watch this archived webinar to learn about modeling the etching of nanostructures in the COMSOL Multiphysics® software.
Derek Bassett of Tokyo Electron America demonstrates using diffusion and surface reactions to describe how solid materials are etched to create nanostructures. In addition, he shares how to account for the changing shape of the simulation domain and discusses the results of the model, including the uniformity of etching adjacent structures, time it takes to etch a material, and depth of the trench.
Tip: Browse for upcoming live webinars here.
Kapitelauswahl
Introduction (0:00)
Background and Motivation (3:27)
Problem and Relevant Physics (6:19)
Chemical Reaction Model (8:07)
Simulation Model (9:41)
Setting Up Boundary Conditions (12:35)
Quasi Steady State Approximation (14:03)
Simulation of Flow Near Wafer Surface (16:31)
Nanoscale Feature Etching Model (18:05)
Etch Rate Limiting Mechanism (19:35)
Etch Rate Variation Test (21:47)
Live Demo (24:29)
Modeling Chemical Etching using COMSOL Multiphysics® (35:25)
Physical Phenomena During Etching (37:13)
Physics Interfaces (41:46)
Couplings for Multiphysics Models (43:53)
Postprocessing (44:42)
Suggested Physics Interfaces for Etching Modeling (45:27)
Q&A (46:09)