Veröffentlichungen und Präsentationen

Multiphysics simulation was used in this work to model inductively coupled plasmas (ICPs). Developing a model of an ICP is challenging due to the complex relationship between the applied electric field and mixture of chemical species that develops. A preliminary model was developed and validated for an Ar/O2 plasma including neutral, ionic, and all major reactions. The validated model was used to explain the etching behavior of a commercially available tool, simulate an atmospheric pressure plasma jet, and investigate dielectric barrier discharge.