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gaussian beam in Laser Heating of a Silicon Wafer
Posted 15.05.2017, 01:21 GMT-4 1 Reply
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Hi i refer to the tutorial of laser heating on silicon wafer for Comsol 5.3: www.comsol.com/model/download/383241/models.mph.laser_heating_wafer.pdf
In the tutorial the gaussian beam profile was given in the following equation:
(p_laser/(2*pi*r_spot^2))*exp(-r_focus^2/(2*r_spot^2))
How was this equation derived? from literature most gaussian beam profile are given in the following instead:
((2*p_laser)/(pi*r_spot^2))*exp(-(2*r_focus^2)/r_spot^2)
I tried finding the forum but there is nothing written about this.
In the tutorial the gaussian beam profile was given in the following equation:
(p_laser/(2*pi*r_spot^2))*exp(-r_focus^2/(2*r_spot^2))
How was this equation derived? from literature most gaussian beam profile are given in the following instead:
((2*p_laser)/(pi*r_spot^2))*exp(-(2*r_focus^2)/r_spot^2)
I tried finding the forum but there is nothing written about this.
1 Reply Last Post 19.05.2017, 09:48 GMT-4
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Posted:
8 years ago
Dear Joel,
You're correct, this example was using a normalization of the Gaussian that isn't typical in the literature (although it did still give the correct total heat load.) Thank you for reporting this. The updated model is available here:
www.comsol.com/model/laser-heating-of-a-silicon-wafer-13835
Best Regards,
You're correct, this example was using a normalization of the Gaussian that isn't typical in the literature (although it did still give the correct total heat load.) Thank you for reporting this. The updated model is available here:
www.comsol.com/model/laser-heating-of-a-silicon-wafer-13835
Best Regards,